Abstract
A novel process for the fabrication of Au nanodisk electrode arrays with controlled disk electrode separation is proposed. This process effectively overcomes the problem of overlapping diffusion layers around interdisks by ensuring sufficient disk separation. Using an SiC mold, an aluminum substrate was imprinted with an ideally ordered pattern with features at prescribed sites that were then selectively etched as through-holes for the deposition of Au. The fabricated Au disk electrode arrays exhibited sigmoidal voltammetric behavior, indicating that the array functioned effectively as an ensemble of single nanoelectrodes.
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