Abstract
The fabrication and electrical characterization of InZnO:N thin film transistors (TFTs) were investigated in this work. The InZnO:N film was deposited on SiO2/p-type Si substrates by radio frequency magnetron sputtering as the active layer of the TFTs at room temperature. In order to optimize the performance of the InZnO:N TFTs, the effect of the oxygen contents in the preparation of the active layer is investigated. We found that an appropriate O2/Ar gas flow ratio is very beneficial for the InZnO:N TFTs, and when the O2/Ar gas flow ratio is at 1/30, the transistor exhibited a high field-effect mobility of 39.3 cm2/Vs, a threshold voltage of 2.4 V and a ION/OFF ratio of 1.1 × 107.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
