Abstract
Nanoimprint lithography is a powerful tool for making large area sub-wavelength scale optical devices with high-throughput fabrication. We developed a thermal nanoimprint lithography process for making sub-wavelength HCG patterns on an SOI substrate. A vertical etching profile and a smooth etched surface, which meet the requirements for Si based HCG structure, were obtained. We fabricated large area (1cm x 1cm) HCG with good uniformity in the entire sample. The clear angular dependence of the reflectivity of Si-HCG can be seen, which is in good agreement with the modeling result. The engineered angular dependence of HCG could be useful for the mode control of VCSELs and spatial mode multiplexers.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
