Abstract
In this work, the feasibility is investigated and confirmed that H3PO4 is used as pore-forming agent in silica antireflective film. The films are prepared by sol–gel method and spinning-coating technique and studied by field-emission scanning electron microscopy (FE-SEM), visible spectroscopy and ellipsometer. The impact of H3PO4 concentration on transmittance is also examined. Transmittance spectra show that silica films feature a marked increase of substrate transmittance almost at all measured wavelengths (325–1000nm) owing to the addition of H3PO4. With the decrease of H3PO4 concentration, films transmittance will rise first and then decrease slightly. And with an increase of 4.1%, a maximum light transmittance of 95.01% is obtained, which is comparable to some other antireflective films using organic templates.
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