Abstract
This study proposes a plasmonic band-stop filter with surface plasmon resonance in a doublelayer wire grid structure targeting short-wavelength visible and near-ultraviolet regions for applications in ultraviolet photography. Using Ag and Al, the rigorous coupling wave of analysis method revealed that the maximum absorption was approximately 90% at 450 nm and 375 nm. The experiments using Ag produced similar results in a simulation. These results demonstrate that plasmonic band-stop filters in the visible and near-UV region can be realized at 450 nm and 375 nm using Ag or Al.
Highlights
Ultraviolet (UV) photography is used in various fields, including medicine, science, engineering, criminal investigation, and visual arts
We propose a plasmonic filter using the propagating surface plasmon polariton in a wire grid (WG) structure
Experiments demonstrated by designing the structure of the doublelayer WG structure, the extraordinary transmission can be achieved at a specific incident angle and light wavelength [1, 2]
Summary
Ultraviolet (UV) photography is used in various fields, including medicine, science, engineering, criminal investigation, and visual arts. In using non-monochromatic light for UV photography, it is necessary to prepare appropriate filters to transmit or stop transmitting a specific wavelength. Experiments demonstrated by designing the structure of the doublelayer WG structure, the extraordinary transmission can be achieved at a specific incident angle and light wavelength [1, 2]. Results of transmittance mapping indicate that transmission phenomena can be explained by the propagating surface plasmon polariton in the double-layer WG structure.
Sign-in/Register to view highlights & summary Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
