Abstract
Si-based nanopillars of various sizes were fabricated by lateral structuring using anisotropic etching and thermal oxidation. We obtained pillars of diameter <500 nm, about 25 μm in height, with an aspect ratio of more than 50. The distance between pillars was varied from 500 nm to 10 μm. Besides the fabrication and structural characterization of silicon nanopillars, implementation of adequate metrology for measuring single pillars is described. Commercial tungsten probes, self-made gold probes, and piezoresistive silicon cantilever probes were used for measurements of nanopillars in a scanning electron microscope (SEM) equipped with nanomanipulators.
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