Fabrication and characterization of anatase TiO 2 thin film on glass substrate grown by pulsed laser deposition

Abstract

Titanium dioxide (TiO 2) films were prepared on glass substrates by pulsed laser deposition using a titanium carbide (TiC) target. The effects of substrate temperature on the crystal structures, surface morphologies and chemical states of the thin films were examined by the X-ray diffraction (XRD), atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS), respectively. The results of XRD and XPS indicated that TiC film was grown at substrate temperature of 293 K, whereas the anatase TiO 2 film was formed at that of 773 K, which had round grains with 11–28 nm and surface roughness was 0.5–1.1 nm.