Abstract
In order to measure heat flux in micro scale space, a thin film heat flux sensor is designed, fabricated and calibrated. Vacuum coating technology is applied to fabricate the sensor with a total thickness of 0.49μm. Silicon dioxide wafer is used as substrate. Cobalt and stibium is deposited on the substrate to form thermopile. Correlation coefficient R is 0.94025. Sensitivity of the heat flux sensor is 0.05062 μV/(W/m2). Time constant of the sensor is 0.66044 seconds. Dynamic test shows that the heat flux sensor responds rapidly to periodic heat flux which is supplied by halogen lamp.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
