Abstract
Abstract Different thin film fabrication techniques of ferro- and piezoelectric materials is described with special emphasis on rf sputtering. The relative advantages and disadvantages of oxide and metallic targets, and the control of stoichiometry by adjusting the target substrate distance and composition of target is described. The possible applications of ferroelectric films in non-volative memories, pyroelectric detectors, electro- and acousto-optic devices is briefly presented. The applications of these films in the fabrication of integrated Surface Acoustic Wave (SAW) devices on Silicon is discussed in some detail. Theoretical calculations of SAW transduction in layered media is used to compare selected ferroelectric (PZT, PbTiO3. LiNbO3 and BaTiO3) and piezoelectric (ZnO, AIN and CdS) films on silicon for their use in SAW devices.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
