Abstract
Conformable phase masks, transparent photopolymers and two photon effects provide the basis for a simple, parallel lithographic technique that can form complex, but well defined three-dimensional (3D) nanostructures in a single exposure step. This paper describes the method, presents examples of its ability to form 3D nanostructures (including freestanding particles with controlled shapes) and comprehensive modeling of the associated optics. Single step, large area 3D pattern definition, subwavelength resolution and experimental simplicity represent features that make this method potentially useful for applications in photonics, biotechnology and other areas.
Highlights
Many forms of nanotechnology in photonics, biotechnology, information storage and other areas require three dimensional (3D) structures with feature sizes in the deep sub-micron or nanometer range
Conformable phase masks, transparent photopolymers and two photon effects provide the basis for a simple, parallel lithographic technique that can form complex, but well defined three dimensional (3D) nanostructures in a single exposure step
This paper describes the method, presents examples of its ability to form 3D nanostructures and comprehensive modeling of the associated optics
Summary
Many forms of nanotechnology in photonics, biotechnology, information storage and other areas require three dimensional (3D) structures with feature sizes in the deep sub-micron or nanometer range. This paper presents a form of 3D two photon lithography that can generate certain important classes of nanostructures in a single exposure step. In this method, passage of unfocused laser pulses through transparent phase masks with subwavelength structures of relief on their surfaces generates complex, but well defined 3D distributions of intensity near the surfaces of the masks. Passage of unfocused laser pulses through transparent phase masks with subwavelength structures of relief on their surfaces generates complex, but well defined 3D distributions of intensity near the surfaces of the masks These intensity distributions expose thick layers of transparent photopolymers that have some two photon sensitivity. Essential optical effects and provide accurate predictions of the geometries of the fabricated structures, including subtle aspects such as polarization dependent behaviors
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