Abstract
This study investigates a novel stereolithography-based technique using ultraviolet (UV) light and photopolymer resin to fabricate porous and robust MIL-101 (Cr) adsorbent layers. A unique acid-base reaction step is integrated to control the void size of the adsorbent layer. To prepare the slurry, ingredients are mixed in specific ratios, comprising photopolymer resin (50–55 %), sodium bicarbonate (20–23 %), and MIL-101 (Cr) (23–30 %). Afterward, the slurry-coated samples are treated with concentrated Hydrochloric acid (HCl, 12 M or 36.5 %) and are cured using UV light after controlled delays, forming a porous adsorbent layer. The adsorbent layers are experimentally characterized as a function of the initial slurry recipe and the time delay between acid treatment and UV curing. Furthermore, scanning electron microscopy (SEM) and energy-dispersive X-ray Spectroscopy (EDS) are used to analyze the coated layers. Water isotherm experiments are performed to test the coated layers performance for both MIL-101 (Cr) powders and coated samples. The void size volume fraction for coated samples is found to vary between 22 % and 42 %, and maximum void size is observed for 27 % adsorbent and 4 seconds time delay. Such a comprehensive characterization provides a rapid and efficient alternative to conventional adsorbent structuring methods for fabricating adsorbent layers.
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