Abstract
We have templated Cu(100) surfaces with self-assembled arrays of atomic nitrogen islands and then used these islands as masks for Co growth. This method of nanolithography enables the creation of Co dot arrays with dot densities 4×1012 cm−2 (27 teradots/in.2). Adjusting the nitrogen coverage also enabled the creation of arrays of Co lines spaced 10 nm (0.01 μm) apart.
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