Abstract
Bragg grating structure in a sol-gel silica waveguide is fabricated on the basis of nanoimprint lithography for biophotonic applications. The process realizes nonstandardized lithography in sol-gel silica at a high resolution for a relatively large area in the range of several micrometers with a resolution in the order of several nanometers. Here we demonstrate structures of 250 and 90 nm resolutions in a sol-gel silica optical waveguide for a large area that is not optimized to date. Bragg grating of a 250 nm periodic structure is realized for a 1 mm long area.
Highlights
Sol gel silica materials have been extensively used in photonic waveguide devices such as electrooptic (EO) modulators [1, 2], biophotonic sensors [3], and other sensors [4, 5]
Green fluorescent protein- (GFP-) doped sol-gel silica waveguide was used in biophotonic sensors to detect organophosphorus (OP) compound when the blue laser pumps the waveguide to extract green light from the waveguide [3]
Bragg grating in an optical waveguide reflects the waveguiding light at a specific wavelength, which works as a reflector at a narrow wavelength in optical devices such as laser diode
Summary
Sol gel silica materials have been extensively used in photonic waveguide devices such as electrooptic (EO) modulators [1, 2], biophotonic sensors [3], and other sensors [4, 5]. Green fluorescent protein- (GFP-) doped sol-gel silica waveguide was used in biophotonic sensors to detect organophosphorus (OP) compound when the blue laser pumps the waveguide to extract green light from the waveguide [3]. The sensitivity of the biophotonic sensors increases when Bragg grating structure is fabricated in the sol-gel waveguide core.
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