Abstract
The positive secondary ion mass spectra (SIMS) have been observed following exposure of polycrystalline Si to molecular F2 at room temperature. Si+ and SiF+ are the only positive ions containing Si or F which are seen with significant intensity. The intensity of the SiF+ peak has been measured as a function of the fluorine coverage as determined by quartz crystal microbalance (QCM) methods. The primary ion beam consisted of 1 keV Ar+ ions at a current density in the range of 10−7 A/cm2. The results of this SiF+ versus nF (fluorine atom density) calibration were found to depend on the energy of the SiF+ ions selected by the energy filter in front of the SIMS quadrupole. The SiF+ peak increases more strongly with nF when low energy SiF+ ions are monitored. This result is consistent with the notion that proportionately fewer low energy secondary ions are observed from surfaces which have a low secondary ion yield.
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