Abstract

This paper reports a simple non-alkoxide sol-gel route for depositing F-doped ZnO thin film on glass substrates. Ammonium fluoride and zinc acetate were used as the dopant precursor and starting material for ZnO, respectively. After the first crystallization at 550°C in air, the sol-gel spin coated ZnO:F thin films at a F concentration 5 at. % degraded the microstructures, electrical conductivity, and optical transmittance. The second post-heat-treatment at 450°C in a reducing environment resulted in higher electrical resistivity than the first post-heat-treatment in air.

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