Abstract
AbstractWe have developed an ultrathin InP template with low defect density on SiO2‐Si and glass substrate by employing wet etching and wafer direct bonding technique. We have demonstrated epitaxial growth on these substrates and GaInAs/InP multiple quantum well layers were grown by low pressure metal‐organic vapor‐phase epitaxy. Photoluminescence measurements of the layers show that they are optically active and we have obtained almost the same intensity from these substrates compared to the InP substrate. These results may be attributed to improvement of InP template quality and should provide further improvements in device performance realized on SiO2‐Si and glass substrate. And, these are promising results in terms of integration of InP‐based several functional optical devices on SiO2‐Si and glass substrate. (© 2013 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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