Abstract
The elastic grain interaction in a 50-nm-thick Pd thin film sputter deposited on a single-crystalline Si substrate has been investigated employing x-ray diffraction residual stress analysis. The occurrence of pronouncedly nonlinear sin2 ψ-plots (i.e., plots of the lattice strain for a particular hkl reflection versus the squared sine of the inclination angle of the diffraction vector with respect to the surface normal ψ) in diffraction stress analysis for the 200 and 222 reflections revealed anisotropic grain interaction of severity not observed before near free surfaces. Application of a direction-dependent elastic grain-interaction model showed that the grain interaction perpendicular to the surface is of Reuss character, whereas the in-plane grain interaction is of Voigt character.
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