Abstract
The synthesis and properties of water wheel-like cyclic oligomer (noriaPY) derivatives (noriaPY-ADs) with pendant adamantyl ester (AD) groups were examined for their application as extreme ultraviolet (EUV) resist materials. NoriaPY-ADs with various degrees of introduction (DI values) of AD groups were synthesized by adjusting the reactant feed ratios and reaction concentration. Solubility, film-forming property, and thermal stability were consistent with differences in DI values. The patterning properties of noriaPY-AD25 (DI= 25%) were examined in an EUV resist system, and noriaPY-AD25 provided a clear line-and-space pattern with 30 nm resolution and a line width roughness (LWR) of 11.3 nm.
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