Abstract
Ar and Ne-Xe (30%) plasmas were generated in a dense plasma-focus device with coaxial electrodes extreme ultraviolet (EUV) lithography. The EUV intensity and the electron temperature were investigated. An input voltage of 4.5 kV was applied to a capacitor bank of 1.53 µF, and the diode chamber was filled with Ar and Ne-Xe (30%) gas at a prescribed pressure. The inner surface of the cylindrical cathode was lined with an acetal insulator. The anode was made of tin metal. The EUV emission signal with a wavelength in the range of 6 16 nm was detected by using a photo-detector (AXUV-100 Zr/C, IRD). The visible emission line was detected by using a composite-grating spectrometer with a working wavelength range of 200 1100 nm (HR 4000CG). The electron temperature could be obtained from optical emission spectroscopy (OES) and was determined by using a Boltzmann plot under the assumption of local thermodynamic equilibrium (LTE).
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