Abstract
We experimentally demonstrated an extreme ultra-low lasing threshold from full-polymeric fundamental microdisk cavities fabricated by a novel fabrication method, the ink-jet printing method, which is much simpler and easier than previous methods such as lithography. The ink-jet printing method provides additive, room-temperature atmospheric, rapid fabrication with only two steps: (i) stacking cladding pedestal and waveguiding disk spots using the ink-jet technique, and (ii) partial etching of the cladding pedestal envelope. Two kinds of low-viscosity polymers successfully formed microdisks with high surface homogeneity, and one of the polymers doped with LDS798 dye yielded whispering-gallery-mode lasing. The fundamental disks exhibited an extremely ultra-low lasing threshold of 0.33 μJ/mm2 at a wavelength of 817.3 nm. To the best of our knowledge, this lasing threshold is the lowest threshold obtained among both organic and inorganic fundamental microdisk cavity lasers with a highly confined structure.
Highlights
Methylaminostyryl)-4H-pyran (Alq3:DCM)-coated PMMA microtoroid exhibited a lasing threshold of 0.88 μJ/mm[2] at a diameter of 40 μm[13]
An etchant droplet for the cladding pedestal was dropped on the stack, and the exposed envelope of the cladding pedestal was partially etched until the etchant was evacuated
Regarding the solvent selection for a polymer pair with different solubility, first, we show the procedure for selecting the solvent for the cladding polymer FZ-001 and disk polymer TZ-001 using Hansen solubility parameters (HSPs)
Summary
Methylaminostyryl)-4H-pyran (Alq3:DCM)-coated PMMA microtoroid exhibited a lasing threshold of 0.88 μJ/mm[2] at a diameter of 40 μm[13]. Ultra-low lasing thresholds were reported in these previous studies[11,12,13,14,15,16,17,22,23], these thresholds were almost performed by microtoroids or conical microcavities, which were formed from reflowed microdisks to increase the Q-factor These microdisks were fabricated using a subtractive method such as the proton beam writing method[11] or lithography with processes including (i) photolithography to create a disk, (ii) etching of the substrate, and (iii) heat reflow to improve surface homogeneities[12,13,14,15,16,17,22,23]. To the best of our knowledge, this lasing threshold is the lowest threshold obtained among both organic and inorganic fundamental microdisk cavity lasers with a highly confined structure
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