Abstract

Magnetic and spintronic media have offered fundamental scientific subjects and technological applications. Magneto-optic Kerr effect (MOKE) microscopy provides the most accessible platform to study the dynamics of spins, magnetic quasi-particles, and domain walls. However, in the research of nanoscale spin textures and state-of-the-art spintronic devices, optical techniques are generally restricted by the extremely weak magneto-optical activity and diffraction limit. Highly sophisticated, expensive electron microscopy and scanning probe methods thus have come to the forefront. Here, we show that extreme anti-reflection (EAR) dramatically improves the performance and functionality of MOKE microscopy. For 1-nm-thin Co film, we demonstrate a Kerr amplitude as large as 20° and magnetic domain imaging visibility of 0.47. Especially, EAR-enhanced MOKE microscopy enables real-time detection and statistical analysis of sub-wavelength magnetic domain reversals. Furthermore, we exploit enhanced magneto-optic birefringence and demonstrate analyser-free MOKE microscopy. The EAR technique is promising for optical investigations and applications of nanomagnetic systems.

Highlights

  • Magnetic and spintronic media have offered fundamental scientific subjects and technological applications

  • We present extreme antireflection (EAR) based on an optical thin-film structure that breaks through the limits of conventional Magneto-optic Kerr effect (MOKE) microscopy

  • We have demonstrated real-time measurement and statistical analysis of magnetic domain reversal beyond the optical diffraction limit and verified the power-law scalability of the Barkhausen jumps depending on domain size down to 10nm scale

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Summary

Introduction

Magnetic and spintronic media have offered fundamental scientific subjects and technological applications. In the research of nanoscale spin textures and state-of-the-art spintronic devices, optical techniques are generally restricted by the extremely weak magneto-optical activity and diffraction limit. Ordinary AR in the order of a few percent is still insufficient to implement high-visibility MOKE microscopy and high-precision characterisation of nanoscale magnetic domains and textures beyond the limits of conventional optics. Such advanced applications require demonstration of extreme anti-reflection (EAR) of

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