Abstract
A d.c. plasma jet chemical vapor deposition process, one of the established coating processes used for the production of crystalline diamond coatings, is introduced. Moving the plasma torch during the deposition process leads to lower substrate temperatures or allows a smaller spray distance. The crystallite size can be decreased using this approach, and the growth rates of the process can be increased. Furthermore, the area deposited with a diamond film can be enhanced.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
