Abstract
In double patterning process, exposure tools are required for better accuracy and productivity. NSR-S620D, which is Nikon immersion scanner, meets these requirements. This paper discusses the current status of Nikon immersion scanner and possibility to extend use of immersion lithography for the 22nm half-pitch and beyond
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
