Abstract
Dopant-defect reactions dominate the defect formation in mono-crystalline ZnO samples implanted with Ag and B ions. This is in contrast to most other ion species studied and results in an enhanced concentration of extended defects, such as stacking faults and defect clusters. Using a combination of B and Ag implants and diffusion of residual Li atoms as a tracer, we demonstrate that extended defects in ZnO act as efficient traps for highly mobile Zn interstitials. The results imply that dynamic annealing involving interaction of point defects with extended ones can play a key role in the disorder saturation observed for ZnO and other radiation-hard semiconductors implanted with high doses.
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