Abstract
Sputtering a thin layer of SiO2 (≈200 nm) followed by high temperature annealing has recently been found to be very promising in promoting quantum well intermixing. The intermixing is thought to be due to point defects generated by the sputtering plasma diffusing through the material during a subsequent high temperature anneal. In this paper, we describe the technique using the sputtered SiO2 and subsequent high temperature annealing, either by rapid thermal Annealer (RTA) or CW Nd:YAG laser operated at 1.064 µm. Differential blue shifts of up to 70 meV and 120 meV have been obtained for InGaAs-InGaAsP and GaInP-AlGaInP material systems. Extended cavity lasers have been fabricated and characterised for both material systems.
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