Abstract
An exposure-schedule theory of uniform diffraction efficiency for a Dynamic-Static speckle multiplexing (DSSM) volume holographic storage system is proposed. The overlap-factor (? overlap) is introduced into the system to compensate for the erasure effect of the static speckle multiplexing scheme. The exposure-schedule which is an inverse recursion formula is determined. Experimental results are obtained in a LiNbO(3):Fe crystal and 400 holograms with uniform diffraction efficiency are achieved by the use of the new exposure-schedule.
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