Abstract
The exposure schedule model of uniform diffraction efficiency in single monomer photopolymer is extended to that in dual monomers with partially-overlapping multiplexing methods. The proposed model can be thought of solving an optimization problem. The exposure schedule for 51 holograms are calculated and verified by the numerical simulation. The result shows that the exposure schedule is effective to produce the uniform diffraction efficiency for the multiplexing holographic storage.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
