Exposure Schedule for Uniform Diffraction Efficiency of Partially-Overlapping Multiple Holograms in Dual Monomers Photopolymers

Abstract

The exposure schedule model of uniform diffraction efficiency in single monomer photopolymer is extended to that in dual monomers with partially-overlapping multiplexing methods. The proposed model can be thought of solving an optimization problem. The exposure schedule for 51 holograms are calculated and verified by the numerical simulation. The result shows that the exposure schedule is effective to produce the uniform diffraction efficiency for the multiplexing holographic storage.