Exploring the effect of thin film thicknesses on linear and nonlinear optical properties of MoO3 thin film

Abstract

The structural, morphological, linear, and nonlinear optical properties of MoO3 thin films deposited by thermal deposition were measured. The effect of various thicknesses of films was studied. The structural and morphological parameters of films, determined by x-ray diffraction, field emission scanning electron microscopy, and AFM images, are compared to the linear and nonlinear optical characteristics of these media. The bandgap of the prepared thin films was obtained from the diffuse reflectance spectroscopy spectra. The electron’s effective mass (me*/m0), linear refractive index (n0), and optical static and high frequency dielectric constant (ɛ0, ɛ∞) values were calculated by using the bandgap energy values. Increasing the thicknesses of thin films decreased the bandgap, increased the root mean square, and increased the size of nanoparticles and the nonlinear response of thin films. The high magnitude of n2 and β was because of MoO3 (300 nm-thickness), which were of the order of 10−5 cm2/W and 10−1 cm/W, respectively. The fluctuations in nonlinear responses observed at different thicknesses are attributed to d–d transitions and intraband scattering of equilibrium electrons influenced by laser radiation, as indicated by the nonlinearity data. The considerably elevated refractive nonlinearity values in the analyzed film materials suggest their potential for practical application in optoelectronic devices.