Exploring the Dielectric Properties of Lanthanide Oxide Thin Films

Abstract

Lanthanide oxides play a crucial role in various applications, such as solid oxide fuel cells, catalysis, and electronics, and their dielectric properties are essential in determining their performance. Ellipsometry is a powerful technique that can provide high-precision information on the dielectric properties of lanthanide oxides. By determining parameters such as the refractive index, thickness, and extinction coefficient of lanthanide oxides, ellipsometry can aid in the design and optimization of lanthanide oxide-based devices and materials for various applications. Our research group is currently using ellipsometry (supported by other characterization techniques) to investigate the dielectric properties of lanthanide oxide thin films, aiming to obtain information about the optical constants, surface roughness, and thickness of the films. This research aims to provide insights into the fundamental properties of lanthanide oxide thin films. Our findings could contribute to the long-term development of more efficient lanthanide oxide-based materials. We present our current findings and discuss the future direction for continued efforts.