Abstract
The structure and bonding in stishovite, SiO2, is explored with Fourier summation and pseudoatom refinement of merged x-ray single crystal and powder diffraction data. Replacement of the 25 lowest-angle, highly extinction-affected, single crystal reflections with structure factors obtained from low-extinction powder diffraction data has resulted in a significant improvement in the analysis compared with earlier studies. The deformation electron density, total electrostatic potential and total and valence electron densities are mapped. Accumulations of electron density are observed in both SiO bonds, together with non-bonding features displayed about the oxygen on both sides of a plane formed by three bonds with Si. Deficits of electron density between O atoms across the shared-edges are rationalized in terms of the Pauli exclusion principle. There is no evidence for strong repulsion of Si atoms across the same ring. The total electrostatic potential has a continuous low value for the vacant channels in the structure along c with localized minima between O atoms on opposite sides of the channel. The sizes of Si and O are related to the electron density and to the electrostatic potential.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.