Abstract
An original preparation technique of the thorium films by electrochemical deposition from thorium nitrate solution on different substrate is reported. It was found that electrochemical deposition of thorium on the metal surface provides the formation of adherent continuous films, while the deposition on the semiconductor substrates leads to the formation of thorium island films. The origin of the observed thorium films formation and the results on the investigation of thorium films on Si(111) and polycrystalline Cu surfaces by XPS and LEIS are discussed.
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