Abstract
Chapter 3 treats the fabrication techniques, characterization schemes and data treatment methods that are very general for the study of optical metamaterials. The chapter starts with a broad overview of fabrication processes commonly used for quasi-two-dimensional optical metamaterials, including electron beam lithography, focused ion beam milling, interference lithography and nanoimprint lithography. We then discuss a few techniques for truly three-dimensional metal-dielectric nanostructures. We also present commonly used characterization methods for testing the spectral properties of optical metamaterials. Finally, in the last section we discuss a technique for the extraction of the homogenized effective parameters from experimental observables.
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