Abstract
Singularities in behaviour of ellipsometric angles via functions of incidence angle of light were revealed experimentally under investigating four types of the samples manufactured on two materials: on dielectric-quartz and on metal-aluminium. Surface roughness was simu lated by creation of artificial relief using a t wo-dimension orthogonal grating (random phase mask). Quadratic defects in the line were subjected to stochastic law of d istribution. The defects were produced by etching in depth up to 1 m and their sizes were equal to 25x25 m and 2.5x2.5 m on each of materials. The impact of sizes of art ificial defects and their density upon polarization of reflected light was investigated by the mu ltip le-angles-of-incidence ellipsometric meas urements at wavelength 0.63m. For the first time, a random phase mask was used for simulat ion of rough surface.
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