Abstract
A copper sample facing an energy-resolved mass spectrometer is biased positively beyond plasma potential in low-pressure argon plasma. Some ions are created in the sheath by electrons extracted from plasma and accelerated toward the mass spectrometer where they are detected according to their energy. Ion energy is related to local electrical sheath potential at which the ion has been created. Therefore, the Ion Distribution Function (IDF) allows us to probe in a nonperturbative way electron-attracting sheath potential. We observe a strong decrease of ion signal a few volts before sample bias. We attribute this effect to the presence of secondary electrons shielding positive sample potential. Potential profile and IDFs are computed using a model including secondary emission. The fit of IDFs provides an estimation of secondary emission yield and secondary electron temperature.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
