Abstract
The measurement of implantation profiles and median implantation depths for keV positrons in solids is described. Details of the experimental technique, which is based on the difference between positron annihilation lineshape parameters in two materials that otherwise appear similar to the incident positrons, are presented, using the examples of aluminium-glass and gold-tungsten. Criteria for the suitability of the two elements of the binary sample are discussed, as are limiting factors such as post-implantation diffusion and trapping at interfaces.
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