Abstract

The effect of sub-ns duration and sub-mJ energy laser pulse on 13.5 nm extreme ultraviolet (EUV) source diameter and conversion efficiency has been investigated. It was demonstrated that an in-band EUV source diameter as low as 18 μm has been produced due to short scale length of the picoseconds duration laser plasma. Such EUV source is suitable for high brightness and high repetition rate metrology applications.

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