Experimental Investigation on Displacement Damage Effects of Trench Field-Stop Reverse-Conducting Insulated-Gate Bipolar Transistor

Abstract

The insulated-gate bipolar transistor (IGBT) is characterized by metal-oxide-silicon (MOS)-gating, high current density, and high blocking capabilities. The trench field-stop reverse-conducting IGBT (TFR-IGBT) is distinguished from conventional IGBT (CON-IGBT) by trench MOS gate, field-stop layer, and collector-short structure. As a composite structure made of MOS and bipolar junction transistors (BJTs), TFR-IGBT is susceptible to displacement damage (DD). This work reports the DD effects on TFR-IGBT with the fast neutron fluence up to a fluence of 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">13</sup> cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">−2</sup> . The transfer, forward conductive, and forward blocking characteristics are degraded subsequent to neutron exposures. The suppression of the hump current in the transfer curve is observed by neutron-induced damage. This article proposes, from a device physics perspective, the mechanism behind the characteristics degradation from DD in TFR-IGBT. The dependencies of the key parameters on neutron fluence are analytically modeled. Our models provide a good fit to the experimental data of the IGP20N65H5 TFR-IGBT subjected to fission neutrons.