Experimental Demonstration of High-Sensitivity Nano capacitors via Advanced Nanofabrication Techniques for Nano Electronic Implementations

Abstract

Nano gap capacitors have recently received significant interest as a key component in a wide range of implementations including photonics, Nanoelectronics, and sensing applications. Many exploratory research projects are being conducted to investigate the electrical characteristics of these nano capacitors. One essential issue that this paper addresses is the need for highly sensitive nano gap capacitors which can be adopted for ultra-low power sensing implementations. In this paper, gold is utilized as the electrode material owing to its superb chemical stability, electrical conductivity, and biocompatibility. The fabrication process is started by designing the mask namely nano gap pad electrodes using AutoCAD software. Subsequently, the designs are finally transferred and fabricated onto a chrome glass surface. In this work, after a combination of conventional photolithography and size reduction approach used to fabricate the device, conventional photolithography is applied to transfer the nano gap pattern onto the gold surface. In order to achieve the desired dimension of the nano gap, a size reduction technique is employed. Describe the most important thing in 2-3 sentences only). Visual inspection using a High Power Microscope (HPM), 3D nano profiler, X-Ray diffractions (XRD), and Field Emission Scanning Electron Microscope (FESEM) have been employed to observe and validate the fabricated structures. Results show that a 2.5 nano Ampere is measured as the applied voltage increases to 10 mV. This firmly demonstrates the ultra-low power consumption, several Pico watts, of these nano gap capacitors. Further, our findings show that the fabricated 4nm gap structure can achieve an approximately 300 nano farad capacitor at low frequencies, which is advantageous for adoption in highly sensitive biosensors.