Abstract
150 keV niobium implantations were performed at RT in magnesium oxide single crystals. Fluences ranged from 1016 to 1017 ions cm−2. The RBS and XPS techniques allowed the characterization of the implantation profiles and the chemical states of the implants. A comparison between the experimental profiles and the theoretical predictions obtained with TRIM calculations showed no agreement between the values of projected range Rp and ΔRp. A spreading in depth of the ion distribution was observed for Nb implantations. XPS measurements showed that the stable oxidation states of Nh were the 5+ and 4+ states.In order to obtain precise information on the mechanisms of such an anomalous diffusion static lattice calculations of defect parameters are performed for the Nb/MgO system. These calculations allow us to obtain precise information on the stable defects associated with the presence of the metallic impurities in MgO single crystals.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
