Abstract

During the heat cleaning process of GaAlAs photocathodes, Ga2O3 and Al2O3 occur through chemical reaction. Adsorption models with Ga2O3 and Al2O3 on Ga0.5Al0.5As(001)β2 (2 × 4) phase are built and calculated through first-principles method. A heat cleaning experiment is performed. Combining the experimental and calculation results, heating temperature and chemical reactions at the surface are analyzed. Work function, electron transfer and dipole moment are analyzed, the reason why quantum efficiency of GaAlAs photocathodes are much lower than that of GaAs photocathodes is analyzed. Additionally, band structure and DOS curves are compared.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.