Abstract

The wide range of applications for photodetectors, such as in space, industry, medical, and military, has garnered significant research attention in recent years. In this study, an n-type single-layer photodetector based on a Cu/CdS/Cu metal–semiconductor-metal structure with a micro interdigitated electrode array (IDE) was fabricated. The surface morphology and absorption properties of the CdS thin films were characterized using atomic force microscopy, scanning electron microscopy, and UV–Vis spectrometry. The photo response characteristics of the photodetector were recorded across wavelengths of 400–780 nm. The optoelectronic analyses of the structure revealed a maximum responsivity value of approximately 98.73 % at 405 nm incident light, with a high response time of about 0.12 s. Furthermore, the structure was theoretically studied and simulated, with the simulation results demonstrating good agreement with the measured experimental evidence. The above results indicate that the present CdS photodetector holds excellent potential for use in high-sensitivity optoelectronic integrated circuits.

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