Abstract
AbstractDC (direct current) graphite electrodes were used to investigate the hydrogen plasma etching characteristics. Results show that the intermittent spark is marked by physical etching, whereas glow discharge is marked by chemical etching. CH4 is the main gas product, together with the existence of C2H6, C2H4, C3H8, and C3H6. A detailed analysis of the 20‐mA glow discharge showed that the chemical reactions due to the plasma occur mainly through hydrogenation reactions on graphite defects, and different plasma action zones on the graphite also play different roles. Additionally, plasma gaseous reaction processes were analyzed through free radical reactions.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
