Abstract
Sputtering power variation plays a vital role in controlling the properties of titanium dioxide (TiO2) films, which in turn have influence on ammonia (NH3) sensing properties. In the present work, TiO2 films were deposited on glass substrates using reactive dc magnetron sputtering at different sputtering powers (100, 150 and 200 W). X-ray diffraction patterns revealed the formation of single phase (anatase) at lower power and mixed phase (anatase and rutile) at higher power. NH3 sensing response was found to be high for the anatase TiO2 film deposited at 150 W. The response values were found to be 1.9–772 for 10–100 ppm of NH3 at room temperature with fast response time (12 s) and recovery time (63 s). The obtained results highlighted the better sensing performance of anatase-TiO2 films towards NH3, due to oxygen vacancies and greater catalytic activity than the mixed phase films. The NH3 adsorption on the TiO2 films followed Elovich equation and the response kinetics were of first order.
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