Expanding thermal plasma CVD of textured ZnO with focus on solar cell applications

R Groenen,J.L Linden,R.E.I Schropp,M.C.M Van De Sanden,J Loffler

doi:10.1109/pvsc.2000.916009

Expanding thermal plasma CVD of textured ZnO with focus on solar cell applications

R Groenen, J.L Linden + Show 3 more

https://doi.org/10.1109/pvsc.2000.916009

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Publication Date: Jan 1, 2000

Affiliation: Eindhoven University of Technology, Utrecht University

#Method For Low Temperature Deposition #Rough Surface Texture + Show 8 more

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Abstract

A new method for low temperature deposition of surface textured ZnO is presented utilizing an expanding thermal plasma created by a cascaded arc. Films have been deposited at 150-350/spl deg/C at a rate of typically 0.65-0.75 nm/s, exhibiting low sheet resistance ( 80%) and a rough surface texture. Surface roughness increases with increasing deposition temperature and film thickness. First pin a-Si:H solar cells deposited on this ZnO show initial efficiencies approaching 10%.

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