Exogenous application of hydrogen peroxide in different resistant bean cultivars of Phaseolus vulgaris to Tetranychus urticae (Acari: Tetranychidae)

Abstract

The enhancement of plant resistance to pest infestation, improving plant growth parameters and productivity is in sustainable agriculture programs. Hydrogen peroxide (H2O2) is among the most effective compounds acts as a messenger molecule involved in acclimatory signaling and triggering tolerance against various biotic and abiotic stresses. In this study, three cultivars of common bean (Phaseolus vulgaris L.), Nebraska, Paulista, and Valentino were treated with H2O2 to evaluate some vegetative parameters, yield and the natural infestations Tetranychus urticae Koch. Leaf area scored the highest size in Valentino cultivar in (742.5 and 722.3 cm2) in response to 1.5 and 1 mM of H2O2 respectively compared to 416.3 cm2 in the control. However, the Paulista cultivar reached the highest size 722.3 cm2 in response to 1.5 mM H2O2 followed by 702.3 cm2 in response to 1 mM H2O2 compared to 401.8 cm2 in the control. Valentino cultivar scored the highest plant heights 81.8 cm in response to 1.5 mM H2O2 followed by 79.2 cm in response to 1 mM H2O2 compared to 43.2 cm in the untreated plants. Valentino cultivar scored the highest number of seeds, pods, and branches compared to the other two cultivars, while Nebraska scored the lowest number of seeds, pods, and branches in response to 1.5 mM hydrogen peroxide compared to control. Nebraska cultivar scored the lowest number of spider mites, T. urticae compared to the other two cultivars in response to 1.5 mM compared to control. An increase in ROS or hydrogen peroxide in the cells in response to exogenous application of hydrogen peroxide could be toxic to the T. urticae and affect its feeding and subsequently mite reproduction. Results from the existing investigation showed that exogenic application of hydrogen peroxide enhanced the resistance of common beans in response to T. urticae feeding.