Abstract
The authors describe a newly developed laser-induced chemical vapor deposition (LCVD) process using an argon-fluoride excimer laser. The LCVD apparatus is equipped with an ultrahigh-vacuum chamber system including an Auger electron spectroscopy (AES) analysis chamber and a focused laser-beam scanning system. Hydrogenated amorphous silicon films free from oxygen contamination are confirmed to be fabricated using the AES analysis before exposing the films to air. Silicon film oxidation process after prolonged exposure to air is also characterized using the AES analysis. Furthermore, the new LCVD process is applied to the fabrication of soft x-ray multilayer mirrors. A tungsten-silicon multilayer mirror with a laterally varying film thickness for high performance soft x-ray focusing systems is successfully obtained on the design rule.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
