Excimer laser annealing process for polysilicon TFT on glass and plastic substrates

C.H Liao,M.C Wang,Si-Chen Lee Si-Chen Lee,An Shih An Shih

doi:10.1109/cleopr.2001.970947

Excimer laser annealing process for polysilicon TFT on glass and plastic substrates

C.H Liao, M.C Wang + Show 2 more

https://doi.org/10.1109/cleopr.2001.970947

Copy DOI

Publication Date: Jul 15, 2001

Affiliation: Chang Gung University, National Taiwan University

#poly-Si TFT #poly-Si TFTs + Show 8 more

Abstract
Full-Text PDF
Similar Papers

Abstract

High-mobility poly-Si TFTs fabricated in low temperature process are required for the next generation of active-matrix liquid-crystal displays (AMLCDs). The mobility of poly-Si TFT exceeds that of the conventional a-Si TFT active device by two orders of magnitude, permitting integration of peripheral devices circuits and increased aperture. With optimized excimer laser annealing process condition, we have successfully fabricated low temperature poly-Si TFT on glass and plastic substrates.

Full Text