Abstract
In this report, 38 nm-thick amorphous zinc-tin oxide (a-ZTO) films were deposited by radio frequency magnetron cosputtering. a-ZTO films were annealed by in situ monitoring of the sheet resistance improvements during the annealing process. A sharp drop in the slope of the sheet resistance curve was observed. The activation energies for the sheet resistance slope were calculated. The activation energy of the reaction for a sharp drop in the slope is much higher than the activation energy for the rest of the slope. Based on the activation energy values, six annealing temperatures were selected to saturate the highest conductivity at lower annealing temperatures and to identify the effects associated with annealing time. We found a direct correlation between annealing temperatures and the duration of the annealing treatment. a-ZTO films with a high conductivity of 320 S/cm were achieved by annealing at a temperature of 220 °C. It is noteworthy that the annealing temperature of 220 °C has clearly replaced the temperature of 300 °C. An irreversible decrease in resistivity was observed for all films. The conduction mechanism of films before and after annealing was determined. We confirm that all films individually exhibit semiconducting and metallic behaviors in the conduction mechanism before and after the lowest resistivity saturation.
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