Abstract
ABSTRACTTantalum oxynitride thin films were prepared by reactive sputtering. The argon and nitrogen flow rate were kept stable whereas oxygen flow rate was incremented periodically. The effect of oxygen flow rate on various properties of tantalum oxynitride thin films is reported in this research paper. XRD patterns of tantalum oxynitride thin films displayed peaks commonly as for nano-crystalline materials. Surface topography observed to be smooth and exhibited smaller grain structure. Wettability test showed promising results for hydrophobicity. Wear test was done on uncoated and coated tantalum oxynitride thin films on 10 mm diameter cylindrical pins of brass and mild steel.
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