Abstract
Procedures are described for the examination in cross section of thin films by atomic force microscopy (AFM), with reference to anodic films on III‐V semiconductors and aluminium as examples of possible applications. It is shown that by preparing cross‐sectional surfaces with a diamond knife, the thickness and morphology of anodic films can be disclosed by AFM at a resolution approaching that of transmission electron microscopy, with features such as local nonuniformity of film thickness and layering of the film being revealed. © 1999 The Electrochemical Society. All rights reserved.
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